The Dry Etching Characteristics of TiO₂ Thin Films in N₂/CF₄/Ar Plasma

Choi, Kyung-Rok Woo, Jong-Chang Joo, Young-Hee Chun, Yoon-Soo Kim, Chang-Il 2014년

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The Dry Etching Characteristics of TiO2 Thin Films in N2/CF4/Ar Plasma