연구동향 분석

총설 : 반도체 소자용 구리 배선 형성을 위한 전해 도금

김명준 ( Myung Jun Kim ) 김재정 ( Jae Jeong Kim ) 2014년

논문상세정보
인용/피인용
' 총설 : 반도체 소자용 구리 배선 형성을 위한 전해 도금' 의 주제별 논문영향력
논문영향력 선정 방법
논문영향력 요약
주제
  • copper
  • damasceneprocess
  • electrodeposition
  • metalinterconnection
  • superfilling
동일주제 총논문수 논문피인용 총횟수 주제별 논문영향력의 평균
294 0

0.0%

' 총설 : 반도체 소자용 구리 배선 형성을 위한 전해 도금' 의 참고문헌

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