Atomic layer deposited ZrxAl1-xOy film as high κ gate insulator for high performance ZnSnO thin film transistor
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Atomic layer deposited ZrxAl1-xOy film as high κ gate insulator for high performance ZnSnO thin film transistor' 의 참고문헌
The deterioration of a-IGZO TFTs owing to the copper diff usion after the process of the source/drain metal formation
Temperature-dependent transfer characteristics of amorphous InGaZnO 4 thin-film transistors
Surface-scattering eff ects in polycrystalline silicon thin-film transistors
Surface chemistry of atomic layer deposition, a case study for the trimethylaluminum/water process
Suppression of crystallization of tantalum oxide thin film by doping with zirconium
Suppression in the negative bias illumination instability of ZnSnO thin-film transistors using hafnium doping by dual-target magnetron cosputtering system
Study on the defects in metal–organic chemical vapor deposited zinc tin oxide thin films using negative bias illumination stability analysis
Structural evolution and defect control of yttrium-doped ZrO 2films grown by a sol–gel method
Solution-deposited Zr-doped AlOx gate dielectrics enabling high-performance flexible transparent thin film transistors
Room-Temperature Fabrication of Transparent Flexible Thin-Film Transistors Using Amorphous Oxide Semiconductors
Role of dopants as a carrier suppressor and strong oxygen binder in amorphous indium-oxide-based field eff ect transistor
Role of Si as carrier suppressor in amorphous Zn–Sn–O
Realization of solution-processed semiconducting single-walled carbon nanotubes thin film transistors with atomic layer deposited ZrAlO x gate insulator
Photon-accelerated negative bias instability involving subgap states creation in amorphous In–Ga–Zn–O thin film transistor
Photo stability of solution-processed low-voltage high mobility zinc-tin-oxide/ZrO2 thin-film transistors for transparent display applications
Performance enhancement in InZnO thin-film transistors with compounded ZrO 2 –Al 2 O 3 nanolaminate as gate insulators
Manifestation of reversal conductivity on high pressurizing of solution-processed ZnSnO thin-film transistors at low temperature
Low-temperature solution-processed ZrO 2 gate insulators for thin-film transistors using high-pressure annealing
Light induced instabilities in amorphous indium–gallium–zinc–oxide thin-film transistors
Investigation of the eff ects of Mg incorporation into InZnO for high-performance and high-stability solution-processed thin film transistors
Investigation of co-sputtered LiZnSnO thin film transistors
Impact of Sn/Zn ratio on the gate bias and temperature-induced instability of Zn-In-Sn-O thin film transistors
High-κ gate dielectrics, current status and materials properties considerations
High performance, low temperature solution-processed barium and strontium doped oxide thin film transistors
Electronic structure of the amorphous oxide semiconductor a-InGaZnO 4 –x, Tauc–Lorentz optical model and origins of subgap states
Effects of argon flow rate on electrical properties of amorphous indium gallium zinc oxide thin-film transistors
Effect of strontium addition on stability of Zinc–Tin–Oxide thinfi lm transistors fabricated by solution process
Effect of hafnium doping on density of states in dual-target magnetron co-sputtering HfZnSnO thin film transistors
Effect of Zr addition on ZnSnO thin-film transistors using a solution process
Effect of Al concentration on the electrical characteristics of solution-processed Al doped ZnSnO thin film transistors
Dan, low-doping eff ects of nanostructure ZnO,Sn tin films annealed at diff erent temperature in nitrogen ambient to be applied as an anti-refl ecting coating
Correlation of band edge native defect state evolution to bulk mobility changes in ZnO thin films
Characterization of intrinsic and impurity deep levels in ZnSe and ZnO crystals by nonlinear spectroscopy
Characterization of dual-target co-sputtered novel Hf-doped ZnSnO semiconductors and the enhanced stability of its associated thin film transistors
Characteristics of SiO2 film grown by atomic layer deposition as the gate insulator of low-temperature polysilicon thin-film transistors
Characteristics of Al 2 O 3 /ZrO 2 laminated films deposited by ozone-based atomic layer deposition for organic device encapsulation
Carrier transport and density of state distributions in pentacene transistors
Atomic layer deposition deposited high dielectric constant (κ) ZrAlOx gate insulator enabling high performance ZnSnO thin film transistors
A study on H 2 plasma treatment eff ect on a-IGZO thin film transistor
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Atomic layer deposited ZrxAl1-xOy film as high κ gate insulator for high performance ZnSnO thin film transistor'
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