연구동향 분석

중성 영역 구리 화학적 기계적 평탄화 공정에서의 작용기에 따른 부식방지제의 영향성 연구

이상원 ( Sang Won Lee ) 김재정 ( Jae Jeong Kim ) 2015년

논문상세정보
인용/피인용
' 중성 영역 구리 화학적 기계적 평탄화 공정에서의 작용기에 따른 부식방지제의 영향성 연구' 의 주제별 논문영향력
논문영향력 선정 방법
논문영향력 요약
주제
  • 1h-1
  • 4-triazole
  • corrosioninhibitor
  • cuchemicalmechanicalpolishing
  • damasceneprocess
  • functionalgroup
동일주제 총논문수 논문피인용 총횟수 주제별 논문영향력의 평균
30 0

0.0%

' 중성 영역 구리 화학적 기계적 평탄화 공정에서의 작용기에 따른 부식방지제의 영향성 연구' 의 참고문헌

  • 반도체 소자용 구리 배선 형성을 위한 전해 도금
    김명준 Korean Chemical Engineering Research(HWAHAK KONGHAK) 52 (1) : 26 ~ 39 [2014]
  • 구리 및 은 금속 배선을 위한 전기화학적 공정
    권오중 Korean Chemical Engineering Research(HWAHAK KONGHAK) 47 (2) : 141 ~ 149 [2009]
  • Triazole, Benzotriazole and Naphthotriazole as Corrosion Inhibitors for Copper
    Walker, R. Corrosion 31 : 97 ~ 100 [1975]
  • The International Technology Roadmap for Semiconductors 2001 Edition Interconnect
    Allan, A. Computer 35 : 42 ~ 53 [2002]
  • The Future of Interconnection Technology
    Theis, T. N. IBM J. Res. Dev. 44 : 379 ~ 390 [2000]
  • Surface Enhanced Raman Scattering in Corrosion Science: Benzotriazole on Copper
    Kester, J. J. J. Electrochem. Soc. 129 : 1716 ~ 1719 [1982]
  • Some Organic Compounds as Inhibitors for the Corrosion of Aluminum Alloy 6063 in Deaerated Carbonate Solution
    Bazzi, L. Corrosion 51 : 811 ~ 817 [1995]
  • Role of Amine and Carboxyl Functional Groups of Complexing Agents in Slurries for Chemical Mechanical Polishing of Copper
    Gorantla, V. R. K. J. Electrochem. Soc. 152 : G912 ~ G916 [2005]
  • Protective Effect of Electropolymerized 3-amino-1,2,4-triazole Towards Corrosion of Copper in 0.5M NaCl
    Trachli, B. Corrosion Sci. 44 : 997 ~ 1008 [2002]
  • Protection of Copper by Pretreatment with Benzotriazole
    Notoya, T. Corrosion 35 : 193 ~ 200 [1979]
  • Photoelectron and Infrared Reflection Absorption Spectroscopy of Benzotriazole Adsorbed on Copper and Cuprous Oxide Surfaces
    Nilsson, J.-O. Appl. Surf. Sci. 37 : 306 ~ 326 [1989]
  • Multilevel interconnections for ULSI and GSI era
    Murarka, S. P. Mater. Sci. Eng. R 19 : 87 ~ 151 [1997]
  • Investigation of cleaning solution composed of citric acid and 5-aminotetrazole
    권오중 The Korean Journal of Chemical Engineering 28 (7) : 1619 ~ 1624 [2011]
  • Electrochemistry of Copper in Aqueous Ethylenediamine
    Aksu, S. J. Electrochem. Soc. 149 : B340 ~ B347 [2002]
  • Effects of 3-amino-1,2,4-triazole on the Inhibition of Copper Corrosion in Acidic Chloride Solutions
    Sherif, E. M. J. Colloid. Interf. Sci. 311 : 144 ~ 151 [2007]
  • Damascene Copper Electroplating for Chip Interconnections
    Andricacos, P. C. IBM J. Res. Dev. 42 : 567 ~ 574 [1998]
  • Copper On-Chip Interconnections
    Andricacos, P. C. J. Electrochem. Soc. Interface 8 : 32 ~ 37 [1999]
  • Copper Metallization for High Performance Silicon Technology
    Rosenberg, R. Annu. Rev. Mater. Sci. 30 : 229 ~ 262 [2000]
  • Copper Interconnection Integration and Reliability
    Hu, C.-K. Thin Solid Films 262 : 84 ~ 92 [1995]
  • Comparison of on-line Enrichment Based on Ion-pair and Cation-exchange Liquid Chromatography for the Trace-level Determination of 3-amino-1,2,4-triazole (aminotriazole) in Water
    Pichon, V. Anal. Chim. Acta 284 : 317 ~ 326 [1993]
  • Chemical Mechanical Planarization for Microelectronics Applications
    Zantye, P. B. Mat. Sci. Eng. R 45 : 89 ~ 220 [2004]
  • Chemical Mechanical Planariation of Microelectric Materials
    Steigerwald, J. M. John Wiley & Sons [1997]
  • Characterization of 5-Aminotetrazole as a Corrosion Inhibitor in Copper Chemical Mechanical Polishing
    Lee, J.-W. J. Electrochem. Soc. 152 : C827 ~ C831 [2005]
  • Benzotriazole as Corrosion Inhibitor for Copper
    Mansfeld, F. Corrosion 27 : 289 ~ 294 [1971]
  • A New Type of Electrochemical Formation of Copper Oxide During Redox Processes of the Copper(II)-glycine Complex at High pH
    Ogura, K. J. Electroanal. Chem. 511 : 122 ~ 127 [2001]
  • A 130 nm Generation Logic Technology Featuring 70 nm Transistors, Dual Vt Transistors and 6 layers of Cu Interconnects
    Tyagi, S. Electron Devices Meeting [2000]
  • 1H-1,2,4-triazole: An Effective Solvent for Proton-conducting Electrolytes
    Li, S. Chem. Mater. 17 : 5884 ~ 5886 [2005]