Nano-wedge RRAM Cross-point Array with Nickel Silicide Bottom Electrode as a Synaptic Device for Neuromorphic Computing Applications = 시냅스 소자 적용을 위한 니켈 실리사이드 웨지구조를 가지는 저항변화 메모리 어레이

이동근 2021년
' Nano-wedge RRAM Cross-point Array with Nickel Silicide Bottom Electrode as a Synaptic Device for Neuromorphic Computing Applications = 시냅스 소자 적용을 위한 니켈 실리사이드 웨지구조를 가지는 저항변화 메모리 어레이' 의 주제별 논문영향력
논문영향력 선정 방법
논문영향력 요약
주제
  • 응용 물리
  • NiSi nano-wedge RRAM array
  • Synaptic devices
  • in-memorycomputing
  • resistive random access memory
  • vector-matrix multiplication
  • wire resistance
  • 뉴로모픽 컴퓨팅
  • 니켈실리사이드
  • 메모리 어레이
  • 벡터행렬 연산
  • 시냅스 소자
  • 웨지구조 저항 변화 메모리 어레이
  • 저항변화 메모리
동일주제 총논문수 논문피인용 총횟수 주제별 논문영향력의 평균
4,689 0

0.0%

' Nano-wedge RRAM Cross-point Array with Nickel Silicide Bottom Electrode as a Synaptic Device for Neuromorphic Computing Applications = 시냅스 소자 적용을 위한 니켈 실리사이드 웨지구조를 가지는 저항변화 메모리 어레이' 의 참고문헌

  • `` Understanding the gradual reset in Pt/Al2O3/Ni RRAM for synaptic applications , '' Semiconductor Science and Technology
    B. SarkarB. LeeV. Misra vol . 30 , no . 10 , p. 105014 [2015]
  • `` Transition of stable rectification to resistive-switching in Ti/TiO 2/Pt oxide diode
    J.-J . HuangC.-W. KuoW.-C. ChangT.-H. Hou '' Applied Physics Lettersvol . 96 , no . 26 , p. 262901 [2010]
  • `` The parasitic effects induced by the contact in RRAM with MIM structure
    Z. LijieH. RuA . Z. H. WangW. DakeW. RunshengK. Yongbian '' in 2008 9th International Conference on Solid-State and Integrated-Circuit Technology20-23 Oct. 2008 2008 , pp . 932-935 , doi : 10.1109/ICSICT.2008.4734687
  • `` TMAH etching of silicon and the interaction of etching parameters
    J. ThongW. ChoiC. Chong '' Sensors and Actuators A : Physical , vol . 63 , no . 3 , pp . 243-249 [1997]
  • `` Scaling effect on silicon nitride memristor with highly doped Si substrate , '' Small
    S. Kim et al. vol . 14 , no . 19 , p. 1704062 [2018]
  • `` Scaling effect of device area and film thickness on electrical and reliability characteristics of RRAM
    J. LeeJ . ParkS. JungH. Hwang '' in 2011 IEEE International Interconnect Technology Conference , 8-12 May 2011 2011 , pp . 1-3 , doi : 10.1109/IITC.2011.5940297
  • `` Resistive Switching by Voltage-Driven Ion Migration in Bipolar RRAM ? Part II : Modeling
    S. LarentisF. NardiS. BalattiD. C. GilmerD. Ielmini '' IEEE Transactions on Electron Devicesvol . 59 , no . 9 , pp . 2468-2475 [2012]
  • `` RRAM-based synapse for neuromorphic system with pattern recognition function , '' in 2012 International Electron Devices Meeting
    S. Park et al. 10-13 Dec. 2012 2012 , pp . 10.2.1-10.2.4 , doi : 10.1109/IEDM.2012.6479016
  • `` RRAM-based synapse devices for neuromorphic systems
    K. Moon et al. '' Faraday discussions , vol . 213 , pp . 421-451 [2019]
  • `` Pulse area dependent gradual resistance switching characteristics of CMOS compatible SiNx-based resistive memory
    M.-H. Kim et al. '' Solid-State Electronics , vol . 132 , pp . 109-114 [2017]
  • `` Overview of resistive random access memory ( RRAM ) : Materials , filament mechanisms , performance optimization , and prospects , '' physica status solidi ( RRL ) ?
    H. WangX. Yan vol . 13 , no . 9 , p. 1900073 [2019]
  • `` Novel in-memory matrix-matrix multiplication with resistive cross-point arrays
    Y. Liao '' in 2018 IEEE Symposium on VLSI TechnologyIEEE , pp . 31-32 [2018]
  • `` Neuronal dynamics in HfO x/AlO y-based homeothermic synaptic memristors with low-power and homogeneous resistive switching
    S. Kim et al. '' Nanoscalevol . 11 , no . 1 , pp . 237-245 [2019]
  • `` Nanoscale Hafnium Oxide RRAM Devices Exhibit Pulse Dependent Behavior and Multi-level Resistance Capability
    K. BeckmannJ. HoltH. ManemJ . Van NostrandN. C. Cady '' MRS Advances , vol . 1 , no . 49 , pp . 3355-3360 , 2016/10/01 2016 , doi : 10.1557/adv.2016.377
  • `` Nano-cone resistive memory for ultralow power operation
    S. Kim et al. '' Nanotechnologyvol . 28 , no . 12 , p. 125207 [2017]
  • `` Multi-layer tunnel barrier ( Ta2O5/TaOx/TiO2 ) engineering for bipolar RRAM selector applications
    J . Woo et al. '' in 2013 Symposium on VLSI Technology11-13 June 2013 2013 , pp . T168-T169
  • `` Mimicking Synaptic Behaviors with Cross-Point Structured TiO x/TiO y-Based Filamentary RRAM for Neuromorphic Applications
    J. KimS. ChoT. KimJ. J. Pak '' Journal of Electrical Engineering & Technology , vol . 14 , no . 2 , pp . 869-875 [2019]
  • `` Metal oxide RRAM switching mechanism based on conductive filament microscopic properties
    G. Bersuker et al. '' in 2010 International Electron Devices Meeting , 6-8 Dec. 2010 2010 , pp . 19.6.1-19.6.4 , doi : 10.1109/IEDM.2010.5703394
  • `` Metal ? Oxide RRAM
    H. P. Wong et al. '' Proceedings of the IEEE , vol . 100 , no . 6 , pp . 1951-1970 [2012]
  • `` Memristors with diffusive dynamics as synaptic emulators for neuromorphic computing
    Z. Wang et al. '' Nature materialsvol . 16 , no . 1 , pp . 101-108 [2017]
  • `` Mechanism of Nonlinear Switching in HfO2-Based Crossbar RRAM With Inserting Large Bandgap Tunneling Barrier Layer
    U. ChandK. HuangC. HuangT. Tseng '' IEEE Transactions on Electron Devicesvol . 62 , no . 11 , pp . 3665-3670 [2015]
  • `` Low-power TiN/Al2O3/Pt resistive switching device with sub-20 μA switching current and gradual resistance modulation , ''
    Y. WuS. YuB. LeeP. Wong Journal of Applied Physicsvol . 110 , no . 9 , p. 094104 [2011]
  • `` Intrinsic switching variability in HfO2 RRAM
    A. Fantini et al. '' in 2013 5th IEEE International Memory Workshop , 26-29 May 2013 2013 , pp . 30-33 , doi : 10.1109/IMW.2013.6582090
  • `` In-memory computing with resistive switching devices
    D. IelminiH. S. P. Wong '' Nature Electronicsvol . 1 , no . 6 , pp . 333-343 [2018/06/01 2018]
  • `` Improvement of HfO x-Based RRAM Device Variation by Inserting ALD TiN Buffer Layer
    Y. Fang et al. '' IEEE Electron Device Lettersvol . 39 , no . 6 , pp . 819-822 [2018]
  • `` Improved synaptic behavior under identical pulses using AlO x/HfO 2 bilayer RRAM array for neuromorphic systems
    J . Woo et al. '' IEEE Electron Device Lettersvol . 37 , no . 8 , pp . 994-997 [2016]
  • `` Improved resistive switching characteristics in Ni/SiN x/p++-Si devices by tuning x
    S. KimY.-F. ChangM.-H. KimB.-G. Park '' Applied Physics Lettersvol . 111 , no . 3 , p. 033509 [2017]
  • `` High-k dielectrics for future generation memory devices ( Invited Paper )
    J . A. Kittl '' Microelectronic Engineering , vol . 86 , no . 7 , pp . 1789-1795doi : https : //doi.org/10.1016/j.mee.2009.03.045 [2009]
  • `` Fully Si compatible SiN resistive switching memory with large self-rectification ratio
    S. KimS. ChoB.-G. Park '' AIP Advancesvol . 6 , no . 1 , p. 015021 [2016]
  • `` Fabrication of RRAM Cell Using CMOS Compatible Processes
    W. LiuK.-L. PeyN. RaghavanC. M. Ng '' ed : Google Patents [2012]
  • `` Experimental investigation of the reliability issue of RRAM based on high resistance state conduction
    L. Zhang et al. '' Nanotechnologyvol . 22 , no . 25 , p. 254016 , 2011/05/16 2011 , doi : 10.1088/0957- 4484/22/25/254016
  • `` Effects of conducting defects on resistive switching characteristics of SiN x-based resistive random-access memory with MIS structure
    S. KimS. ChoK.-C. RyooB.-G. Park '' Journal of Vacuum Science & Technology B , Nanotechnology and Microelectronics : Materials , Processing , Measurement , and Phenomena , vol . 33 , no . 6 , p. 062201 [2015]
  • `` Effects of RRAM Stack Configuration on Forming Voltage and Current Overshoot
    D. C. Gilmer '' in 2011 3rd IEEE International Memory Workshop ( IMW ) , 22-25 May 2011 2011 , pp . 1-4 , doi : 10.1109/IMW.2011.5873225
  • `` Dot-product engine for neuromorphic computing : Programming 1T1M crossbar to accelerate matrix-vector multiplication
    M. Hu et al. '' in 2016 53nd ACM/EDAC/IEEE Design Automation Conference ( DAC )IEEE , pp . 1-6 [2016]
  • `` Distributed In-Memory Computing on Binary RRAM Crossbar
    L. NiH. HuangZ. LiuR. V. JoshiH. Yu '' J. Emerg . Technol . Comput . Syst. , vol . 13 , no . 3 [p. Article 362017]
  • `` Crossbar RRAM arrays : Selector device requirements during write operation
    S. KimJ. ZhouW. D. Lu '' IEEE Transactions on Electron Devicesvol . 61 , no . 8 , pp . 2820-2826 [2014]
  • `` Brain-inspired computing with resistive switching memory ( RRAM ) : Devices , synapses and neural networks
    D. Ielmini '' Microelectronic Engineering , vol . 190 , pp . 44-53doi : https : //doi.org/10.1016/j.mee.2018.01.009 [2018/04/15/ 2018]
  • `` An electronic synaptic device based on HfO2TiOx bilayer structure memristor with self-compliance and deep-RESET characteristics
    J. Liu et al. '' Nanotechnologyvol . 29 , no . 41 , p. 415205 [2018]
  • `` AlOx-Based Resistive Switching Device with Gradual Resistance Modulation for Neuromorphic Device Application
    Y. Wu et al. '' in 2012 4th IEEE International Memory Workshop , 20-23 May 2012 2012 , pp . 1-4 , doi : 10.1109/IMW.2012.6213663
  • `` Advances and trends of RRAM technology
    G. Jurczak '' in Proc . SEMICON [2015]
  • `` A neuromorphic visual system using RRAM synaptic devices with sub-pJ energy and tolerance to variability : Experimental characterization and large-scale modeling
    S. YuB. GaoZ. FangH. YuJ. KangH.-S. P. Wong '' in 2012 International Electron Devices MeetingIEEE , pp . 10.4 . 1-10.4 . 4 [2012]
  • `` A Comprehensive Study of the Resistive Switching Mechanism in $ \hbox { Al/TiO } _ { x } /\hbox { TiO } _ { 2 } /\hbox { Al } $ - Structured RRAM
    S. KimY. Choi '' IEEE Transactions on Electron Devicesvol . 56 , no . 12 , pp . 3049-3054 [2009]
  • `` 10×10nm2 Hf/HfOx crossbar resistive RAM with excellent performance , reliability and low-energy operation , '' in 2011 International Electron Devices Meeting
    B. Govoreanu et al. 5-7 Dec. 2011 2011 , pp . 31.6.1- 31.6.4 , doi : 10.1109/IEDM.2011.6131652
  • [1] R. Bez and P. Cappelletti, "Flash memory and beyond," in IEEE VLSI?TSA International Symposium on VLSI Technology, 2005. (VLSI-TSA?Tech). 25-27 April 2005 2005, pp. 84-87, doi: 10.1109/VTSA.2005.1497090.
  • [17] S. Z. Rahaman et al., "Scalability and reliability issues of Ti/HfO x?based 1T1R bipolar RRAM: Occurrence, mitigation, and solution," Applied Physics Letters, vol. 110, no. 21, p. 213501, 2017.
  • [11] S. Ambrogio et al., "Neuromorphic learning and recognition with one?transistor-one-resistor synapses and bistable metal oxide RRAM," IEEE Transactions on Electron Devices, vol. 63, no. 4, pp. 1508-1515, 2016.
  • S. Due ? as et al. , `` Memory maps : reading RRAM devices without power consumption
    '' ECS transactions , vol . 85 , no . 8 , p. 201 [2018]
  • S. Due ? as , and H. Cast ? n , `` Controlling the intermediate conductance states in RRAM devices for synaptic applications
    H. GarcaO. G. Ossorio '' Microelectronic Engineering , vol . 215 , p. 110984 , 2019/07/15/doi : https : //doi.org/10.1016/j.mee.2019.110984 [2019]
  • Nano-wedge RRAM Cross-point Array with Nickel Silicide Bottom Electrode as a Synaptic Device for Neuromorphic Computing Applications = 시냅스 소자 적용을 위한 니켈 실리사이드 웨지구조를 가지는 저항변화 메모리 어레이