연구동향 분석

반도체 제조공정에 적용하기 위한 화학적인 식각에서의 실리콘과 게르마늄 식각 선택비 구현 및 표면 거동 연구 = The control of etch selectivity and the surface behavior study of silicon & germanium in chemical etching for semiconductor process

이경호 2020년

논문상세정보
인용/피인용
' 반도체 제조공정에 적용하기 위한 화학적인 식각에서의 실리콘과 게르마늄 식각 선택비 구현 및 표면 거동 연구 = The control of etch selectivity and the surface behavior study of silicon & germanium in chemical etching for semiconductor process' 의 주제별 논문영향력
논문영향력 선정 방법
논문영향력 요약
주제
  • 게르마늄
  • 반도체
  • 습식 식각
  • 식각 선택비
  • 실리콘
  • 표면 개질
  • 표면 거칠기
동일주제 총논문수 논문피인용 총횟수 주제별 논문영향력의 평균
318 0

0.0%

' 반도체 제조공정에 적용하기 위한 화학적인 식각에서의 실리콘과 게르마늄 식각 선택비 구현 및 표면 거동 연구 = The control of etch selectivity and the surface behavior study of silicon & germanium in chemical etching for semiconductor process' 의 참고문헌

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