[141] S.K. Vasheghani Farahani, T.D. Veal, J.J. Mudd, D.O. Scanlon, G.W. Watson, O. Bierwagen, M.E. White, J.S. Speck, andC.F. McConville, Phys. Rev. B 90, 155413 (2014).
90 , 155413 ([2014]
[140] T. Nagata, O. Bierwagen, Z. Galazka, S. Ueda, M. Imura, Y. Yamashita, and T. Chikyow, Jpn. J. Appl. Phys. 58, 080903 (2019).
[13] P. Lippens and U. Muehlfeld, Indium Tin Oxide (ITO): Sputter Deposition Processes, Handbook of Visual Display Technology, Springer Berlin Heidelberg (2012).
[139] A.M. Venezia, R. Bertoncello, and G. Deganello, Surf. Interf. Anal. 23, 239 (1995).
[138] K. Wang, Y.Chang, L. Lv, and Y. Long, Appl. Surf. Sci. 351, 164 (2015).
351 , 164[2015]
[137] H.-W. Lee and W.-J.Cho, AIP Adv. 8, 015007 (2018).
[135] Y. Wen, H. Ding, and Y. Shan, Nanoscale 3, 4411 (2011).
3 , 4411[2011]
[133] J.H. Hubbell and S.M. Seltzer, X-Ray Mass Attenuation Coefficients, (2004) (doi: https://dx.doi.org/10.18434/T4D01F). [134] R.O. Ansell, T. Dickinson, A.F. Povey, and P.M.A. Sherwood, J. Electron Spectrosc. Relat. Phenom. 11, 301 (1977).
[132] B.D.Cullity and S.R. Stock, Elements of X-ray diffraction, 3rd Edition, Prentice Hall (2001).
3rd Edition[2001]
[131] F.T.L. Muniz, M.A.R. Miranda,C. Morilla dos Santos, and J.M. Sasaki, ActaCryst. A 72, 385 (2016).
72 , 385[2016]
[130] J.E. Dominguez, L. Fu, and X.Q. Pan, Appl. Phys. Lett. 81, 5168 (2002).
81 , 5168[2002]
[12] M. Nagasawa and S. Shionoya, Jpn. J. Appl. Phys. 10, 727 (1971).
[128] N.H. Hong and J. Sakai, Phys. B: Condens. Mat. 358, 265 (2005).
[126] H. Mun, H. Yang, J. Park,C. Ju, and K.Char, APL Mater. 3, 076107 (2015).
3 , 076107 ([2015]
[124] P. Mohn, Magnetism in the Solid State, Springer-Verlag Berlin Heidelberg (2003).
[2003]
[123] W. Wu, Z. Wu, T. Yu,C. Jiang, and W.-S. Kim, Sci. Technol. Adv. Mater. 16, 023501 (2015).
16 , 023501[2015]
[122] R. Ranchal, B.S. Yadav, and A. Trampert, J. Phys. D: Appl. Phys. 46, 075003 (2013).
46 , 075003 ([2013]
[121] L.G. Parratt, Phys. Rev. 95, 359 (1954).
[120] S. Shi, D. Gao, Q. Xu, Z. Yang, and D. Xue, RSC Adv. 4, 45467 (2014).
4 , 45467[2014]
[11] C.G. Fonstad and R.H. Rediker, J. Appl. Phys. 42, 2911 (1971).
[119] A.T. Apostolov, I.N. Apostolova, S. Trimper, and J.M. Wesselinowa, Mod. Phys. Lett. B 31, 1750351 (2017).
31 , 1750351[2017]
[118] H. Wang, Y. Yan, K. Li, X. Du, Z. Lan, and H. Jin, Phys. Status Solidi B 247, 444 (2010).
247 , 444[2010]
[116] L. Zhang, S. Ge, Y. Zuo, B. Zhang, and L. Xi, J. Phys.Chem.C 114, 7541 (2010).
114 , 7541[2010]
[115] G.S.Chang, J. Forrest, E.Z. Kurmaev, A.N. Morozovska, M.D. Glinchuk, J.A. McLeod, A. Moewes, T.P. Surkova, and N.H. Hong, Phys. Rev. B 85, 165319 (2012).
85 , 165319[2012]
[114] Ç. Kılıç and A. Zunger, Phys. Rev. Lett. 88, 095501 (2002).
[113] G. Rahman, V.M. García-Suárez, and S.C. Hong, Phys. Rev. B 78, 184404 (2008).
B 78 , 184404[2008]
[112] J.M.D. Coey, Nat. Mater. 18, 652 (2019).
[111] M. Venkatesan,C.B. Fitzgerald, and J.M.D.Coey, Nature 430, 630 (2004).
430 , 630[2004]
[110] A. Sundaresan, R. Bhargavi, N. Rangarajan, U. Siddesh, and C.N.R. Rao, Phys. Rev. B 74, 161306 (2006).
[10] J.C.C. Fan and J.B. Goodenough, J. Appl. Phys. 48, 3524 (1977).
48 , 3524 ([1977]
[109] S. Mal, S. Nori, J. Narayan, J.T. Prater, and D.K. Avasthi, Acta Mater. 61, 2763 (2013).
[108] V.K. Paidi, D.L. Brewe, J.W. Freeland,C.A. Roberts, and J. van Lierop, Phys. Rev. B 99, 180403 (2019).
99 , 180403[2019]
[107] H. Ohno, Science 281, 951 (1998).
[106] W.Y.Choi, H.-J. Kim, J.Chang, S.H. Han, A. Abbout, H.B.M. Saidaoui, A. Manchon, K.-J. Lee, and H.C. Koo, Nano Lett. 18, 7998 (2018).
18 , 7998[2018]
[105] Y. Ogo, H. Hiramatsu, K. Nomura, H. Yanagi, T. Kamiya, M. Hirano, and H. Hosono, Appl. Phys. Lett. 93, 032113 (2008).
93 , 032113 ([2008]
[104] A. Sirelkhatim, S. Mahmud, A. Seeni, N.H.M. Kaus, L.C. Ann, S.K.M. Bakhori, H. Hasan, and D. Mohamad, Nano-Micro Lett. 7, 219 (2015).
7 , 219[2015]
[103] P.A.Cox, W.R. Flavell, and R.G. Egdell, J. Solid StateChem. 68, 340 (1987).
68 , 340[1987]
[101] P.G. de Gennes, Rev. Mod. Phys. 57, 827 (1985).
57 , 827[1985]
[100] J.B. Pedley and E.M. Marshall, J. Phys. Chem. Ref. Data 12, 967 (1983).
Y. Shigesato , and I. Yasui
38 , 5224 ([1999]
X-Ray Photoelectron Spectroscopy in Analysis of Surfaces , Encyclopedia of Analytical Chemistry
[2000]
W. Prellier , and A. Hassini
17 , 1697 ([2005]
W. Prellier , J. Sakai , and N.T . Huong
17 , 6533[2005]
V. Avrutin , N. Izyumskaya , Ü. Özgür , and H. Morkoç
48 , 458 ([2010]
Transparent Oxide Semiconductors : Fundamentals and Recent Progress
[2010]
Transparent Oxide Electronics : From Materials to Devices
[2012]
Surface Plasmons on Smooth and Rough Surfaces and on Gratings
[1988]
Surface Design : Applications in Bioscience and Nanotechnology
Inc. ([2009]
Stranick and A. Moskwa
2 , 45[1993]
S. Zafeiratos , M. Hävecker , A. Knop-Gericke , and R. Schlögl
73 , 245312 ([2006]
Physics of Semiconductor Devices
Inc.[2006]
N. Garino , A. Virga , C.F . Pirri , and P. Mandracci
8 , 8032 ([2016]
Materials for High-Temperature Semiconductor Devices
[1995]
L.K . Dua , and L. Chkoda
29 , 323 ([2006]
J.A . Nees , and P.P . Pronko
91 , 1060 ([2002]
J. Magn .
426 , 545 ([2017]
J. Jové , and T. Roisnel
135 , 140[1998]
Introduction to Solid State Physics , 8th ed.
Inc.[2004]
Handbook of X-ray Photoelectron Spectroscopy : A Reference Book of Standard Spectra for Identification and Interpretation of XPS data
[1992]
Handbook of Transparent Conductors
[2010]
Handbook of Cosmic Hazards and Planetary Defense
[2015]
G. Panaccione , P. Torelli , D.J . Payne , A. Bourlange , and R.G . Egdell
100 , 167402 ([2008]
F. Kubel , C. Puls , A. Limbeck , H. Hutter , L.A. Boatner , M. Schmid , and U. Diebold
85 , 115441 ([2012]
Collins and A.S. Ferlauto , 2 - Optical Physics of Materials , Handbook of Ellipsometry
[2005]
B. Kupfer , Y. Bouhadana , E. Rosh-Hodesh , and A. Zaban