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Characteristics of the higher-k Hf-Zr-O dielectric materials on Si Ge substrates and their application in 3-dimensional Tri-Gate FET devices

이재호 2016년

논문상세정보
인용/피인용
' Characteristics of the higher-k Hf-Zr-O dielectric materials on Si Ge substrates and their application in 3-dimensional Tri-Gate FET devices' 의 주제별 논문영향력
논문영향력 선정 방법
논문영향력 요약
주제
  • 기술과 연합작용
  • 3d structure
  • Aluminium oxide
  • Ge substrate
  • GeON
  • HZO
  • Hafnium Oxide
  • High-k gate dielectrics
  • Passivation Layer
  • Planar FET
  • Silicon oxide
  • Tri-Gate FET
  • metal gate
  • monoclinic
  • tetragonal
동일주제 총논문수 논문피인용 총횟수 주제별 논문영향력의 평균
596 0

0.0%

' Characteristics of the higher-k Hf-Zr-O dielectric materials on Si Ge substrates and their application in 3-dimensional Tri-Gate FET devices' 의 참고문헌

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