연구동향 분석
박사

투명 전도성 박막특성 및 염료감응 태양전지의 응용에 관한 연구

김성진 2015년

논문상세정보
인용/피인용
' 투명 전도성 박막특성 및 염료감응 태양전지의 응용에 관한 연구' 의 주제별 논문영향력
논문영향력 선정 방법
논문영향력 요약
주제
  • ato/ag counter electrode
  • ato/ag 상대전극
  • dye sensitized solar cells
  • ito thin film
  • ito 박막
  • low temperature processing
  • metal grid mesh
  • nano structure
  • rapid thermal annealing
  • rf magnetron sputtering
  • sol coating
  • thermal roll imprinting
  • transparent conducting thin film
  • 급속 열처리 rf 마그네트론 스퍼터링
  • 나노 구조
  • 메탈 그리드 메쉬
  • 바 코팅
  • 열형각인롤
  • 염료감응 태양전지
  • 저온 공정
  • 투명전극
동일주제 총논문수 논문피인용 총횟수 주제별 논문영향력의 평균
281 0

0.0%

' 투명 전도성 박막특성 및 염료감응 태양전지의 응용에 관한 연구' 의 참고문헌

  • 김현주, 이동윤, 보근, 이원재, 송재성, 이대열, J
    KIEEME., 27. 12 [2004]
  • 김종태, 김 참, 정선주, 한윤수
    Applied Chemistry., 13. 1 [2009]
  • Y. Wang, Journal of Physics: Conference Series 152, 012023, (2009).
  • W. J. Jeong, J. C. Cho, Y.K. Jeong and Y. T. Yoo, J. of the Korean SensorsSociety., 6, 49 (1997).
  • Thornton, J. A., Ann. Rev. Mater. Sci., 7, 239 (1997)
  • T.minami, H.nanto and S.Takaka, thin solid Films., 124, 43 (1985)
  • S. R. Forrest, Nature, 428, 911 (2004).
  • S. Muranaka, T. Bando, and T. Takada, Thin Solid Films., 151, 355 (1987).
  • S. J. Lee, H.W. Yoon, B. S. Kim, S.U. Lee, M.W. park and D.J. Kwak., J.Kor. Inst. Met&Mater., 42, 745 (2004).
  • Masayuki Kamei, Yuzo shigesato, Satoru Takaki, Thin Solid Films,Volume., 259 38 (1995)
  • M. K. Nazeeruddin, A. Kay, R. Humpbry-Baker, E. Miller, P. Liska,N.Vlachopoulos and M. Gratzel, J. Am. Chem. Soc., 115, 6382 (1993).
  • K. Daoudi, S.Sandu, V.S.Teodorescu, C.Ghica, B.Canut, M.G.Blanchin,J.A.Roger, .Oueslati, B.Bessais, Crystal Engineering., 5,187 (2002).
  • Jun Hong Noh, Sangwook Lee, Jin Young Kim, Jung-Kun Lee, Hyun SooHan, Chin Moo Cho, In Sun Cho, Hyun Suk Jung and Kug Sun Hong J. Phys.Chem. C., 113, 1083 (2009).
  • J. L. Vossen, “Tin-Antimony Oxide Transparent Conductors Depositionby RF Sputtering “Proc. 3rd Symp”. On the Deposition of Thin Films bySputtering Univ. of Rochester, September 1969, Bendix Corporation,Rochester, N. Y. P.80 (1969).
  • I. Hamberg and C. G. Granqvist, J. Appl. Phys., 60, 123 (1986).
  • H. Lim, C. M. Bae, Y. K. Kim, C. H. Park, W. J. Cho, and C. S. Ha, Syn. Met.,49, 135 (2003).
  • H. L. Hartnagal, “Semiconductor Transparent Thin FILMS”, Institute ofPhysics Publishing Bristol and Philadelphia, pp. 4~9, (1995)
  • H. Kim, J. S. Horwitz, G. P. Kushto, Z. H. Kafafi, and D. B. Chrisey, Appl.Phys. Lett, 79, 284 (2001).
  • H. Iida, T. Mishuku, A. Ito&K.Kata, Solar Enery Materials., 17, 407(1988)
  • G.Frank and H. Kostlin Solids and Surface Vol., 27. 197 (1982)
  • D. Satas, A. A. Tracton, Coatings Technology Handbook, Marcel Dekker(New York, (2001).
  • C. A. Vincent, J. Electrochem. Soc., 119, 515 (1972)43
  • B.O’Regan and M. Grtzel, Nature., 353, 737, (1991).
  • Y. Kim, S. Heo, H. Lee, Y. Lee, I. Kim, M. Kang, D. Choi, B. Lee, M. Kimand D. Kim : Applied Surface Science., 258 3903 (2012).
  • Y. C. Lee, S. Y. Hu, W. Water, Y. S. Huang, M. D. Yang, J. L. Shen, K. K.Tiong and C. C. Huang, Solid State Comm., 143 250 (2007).
  • X. Zi-Qiang, D. Hong, L. Yan, and C. hang, Materials Science inSemiconductor Processimg., 9, 132 (2006).
  • Wang, X, Zhi, L., Tsao, N., Tomovi?, ?., Li, J., and Mullen, K AngewandteChemie., 120, 3032 (2008).
  • W. Bergermayer, I. Tanaka, Appl. Phys. Lett., 84, 909 (2004).
  • V Sivaji Reddy, K Das, A Dhar, and S K Ray.Semicond Sci. Technol., 211747 (2006)
  • T.Minami, J. Vac. Sci. Technol., A17, 1765 (1999)
  • T. Trindade, P O'Brien, NL Pickett. Chem. Mater., 13, 3843 (2001).
  • T, Minami, H. Nanto and S.Takata, Jap. J. Appl. Phys., 249, 605 (1985).
  • Shinho. Cho, Journal of the Korean Vacuum Society, Vol., 18, 5 (2009).
  • Shang, Chou chang, Microelectronics Journal., 38 1220 (2007)
  • R. N. Joshi, V. P. Singh and J. C. McClure, Thin Solid Films., 257 32(1995)
  • R. B. H. Tahar, T, Ban, Y. Takahashi, J. Appl. Phys. 83., 2631 (1998).
  • Park JH. Choi KJ, Kang S W, Seo Y, Kang YS, Kim J,et al, J PhotochemPhotobiol A chem., 213. 1 (2010).
  • P. Sujatha Devi a, M. Chatterjee, and D. Ganguli, Mat. Lett., 55, 205(2002).
  • P. Nunes, D. Costa, E. Fortunato, and R. Martins, Vacuum., 64, 293(2000).
  • Nilsing M, Lunell S, Persson P, Ojamae L, Surf Sci., 582, 49 (2005).
  • Na, S. I. Kim, S.S. Jo, J. and Kim, D. Y, Adv. Mater., 21, 4061 (2008)
  • Ma, W. Song, L, Yang, R, Zhang, T. Zhao, Y. et al. Nano Letters., 8, 2307(2007).
  • M. Wu, X. Bo, J. C. Sturm, and S. Wagner et al, “IEEE T. Electron., 49,861993 (2002).
  • M. Venkatesan, S. MCgee and U. Mitra, Thin Solid Films., 170, 15187(1989).
  • M. Nisha, Appl. Surf. Sci., 252, 1430 (2005)
  • M. Kojima, H. Kato and M. Gallo, Philosophical Magazine B., 73, 289(1996).
  • Lee, K-Y., Connor, S. T., Cui, Y. and Peumans, P. Nano Lett., 8, 689(2008).
  • L.J. Meng, M.P. dos Santos, Thin Solid Films., 289, 65 (1996).
  • Kwang-Hyuk Choi, Ho-Jun Nam, Jin-A Jeong, Sung-Woo Cho, Han-KiKim et al. Appl. Phys. Lett., 92, 223302 (2008).
  • K.Zhang, F. Zhu, C.H.A. Huan, A.T.S. Wee, J. Appl. Phys., 86, 74 (1999).
  • K.L. Chopra, S. Major and D.K. Pandya, Thin Solid Films., 102, 1 (1983).
  • K. Y. cheong, N. Muti and S. R. Ramanan Thin solid Films., 10, 142(2002).
  • K. Suzuki and M. Mizuhashi, Thin Solid Films 97, 119., (1982).
  • K. S. Jones et al. Appl. Phys. Lett., 78 12 (2001)
  • K. L. chopra, S. Major and D. K. Dandya, Thin Solid Films., 102, 3 (1983)
  • K. Alzoubi, M.M. Hamasha, S. Lu and B. Sammakia, J. Disp.Technol., 7,593 (2011).
  • J.H.Noh, S.Lee, J.Y.Kim, J.K.Lee, H.S.Han, C.M.Cho, I.S.Cho, H.S.Jung,K.S.Hong, J. Phys.Chem., 113, 1083. (2009).
  • J. Van de lagematt, N.-G. Park, A.J. Frank, J. Phys. Chem. B., 104, 2044(2000)
  • J. T. Hwang, J. M. Son, I, N. Kang and Y. S. Bu, Polym. Sci. Technol., 14554 (2003)
  • J. S. Willams and J. M. Poate, eds., Ion Implantation and BeamProcessing(Academic Press, New York, (1984)
  • J. P. chatelon, C. Terrier, E. Bernstein, R. Berjon and J. A. Roger, ThinSolid Thin Films., 247, 162 (1994)
  • J. P. Wiff. Y. Kinemuchi and K, wateri, Mater. Lett., 63, 2470 (2009).
  • J. Montero, C. Guillen, J. Herrero, Solar Eng Matter Solar Cells., 95,1542113 (2011).
  • J. George, C.S. Menon, Surf. Coat. Technol., 132 45 (2000)
  • J. F Chang and M, H, Hon, Thin Solid Films.,386, 79 (2001).
  • Ho chul Lee, Dong Wook Lee et al, “The growth of indium tin oxide thinfilms on glass substrates using DC reactive magnetron sputtering ” ,Vacuum., 72, 269 (2004)
  • H.Stroescu, M. Anastasescu, S.Preda, M.Nicolescu, M.stoica, N.stefan, M.Gartner Thin Solid Thin Films., 247, 162 (2012)
  • H.R. Fallah, M. Ghasemi, A. Hassanzadeh, H. Steki, Mater. Res. Bull., 42487 (2007).
  • H. Kim, A. Pique. Appl. Phys. Lett., 84, 218 (2004).
  • H. K. Yu, S. Kim, B. Koo, G. H. Jung, B. Lee, J. Ham and J. L. Lee,Nanoscale., 4, 6831 (2012).
  • H. Hosono, H. Ohta, M. Orita, K. Ueda and M. Hirano, Vacuum., 66, 419(2002).
  • G. A. Potoczny, T. S. Bejitual, J. S. Abell, K. A. Sierros, D. R. Cairns, andS. N. Kukureka, Thin Solid Films., 528., 205 (2013).
  • F. J. Berry, C. Greaves, J. Chem. Soc. Dalton Trans., 12, 2447 (1981).
  • Daeil, Kim, Steven Kim, Surface and Coating Technology., 154, 204(2008).85
  • D.C. Reynolds, D.C. Look, B. Jogai and H.Morko, Solid state Commun.,101, 643 (1977).
  • C. Korber, J. Suffner, and A. Klein, J. Phys. D: Appl. Phys., 43, 29(2010).
  • C. He, L. Zhao, Z. Zheng, F. Lu, J. Phys. Chem. C Vol., 112, 18730(2008).
  • C. Guillen, J. Herrero, Vacuum., 80, 615 (2006)
  • B.O'Regan, M. Gratzel, Nature., 353. 734 (1991).
  • B. Stjerna, E. Olsson, C.G. Granqvist, J. Appl. Phys. 76., 3797 (1994).
  • A. Hauch and A. George, Electrochim. Acta., 46. 3457 (2001).
  • A. Eshaghi, A. Graeli, Optik 125., 1478 (2014).