Soon-Gil Yoon

검색결과
제목	활용도	공유도	영향력
Characteristics of low-temperature at 80°C HfO2 deposited by ALD (Atomic Layer Deposition) and electrical properties of NMOS capacitor Kyoung-Mun Kim Soon-Gil Yoon Nak-Kwan Chung 한국진공학회[2019] Google Scholar 네이버 전문정보