Kyoung-Mun Kim

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제목	활용도	공유도	영향력
Characteristics of low-temperature at 80°C HfO2 deposited by ALD (Atomic Layer Deposition) and electrical properties of NMOS capacitor Kyoung-Mun Kim Soon-Gil Yoon Nak-Kwan Chung 한국진공학회[2019] Google Scholar 네이버 전문정보